ISO INTERNATIONAL STANDARD 17109 Second edition 2022-03 Surface chemical analysis Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films Analyse chimique des surfaces - Profilage d'épaisseur - Meéthode pour la détermination de la vitesse de pulverisation lors du profilage d'epaisseur par pulverisation en spectroscopie de photoélectrons par rayons X, spectroscopie d'électrons Auger et spectrométrie de masse des ions secondaires a I'aide de films minces multicouches Reference number IS0 17109:2022(E) ISO @ISO2022 IS0 17109:2022(E) COPYRIGHTPROTECTED DOCUMENT @ISO2022 All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on the internet or an intranet, withoutpriorwrittenpermission.Permission can berequestedfrom eitherIso at theaddress below orIso'smemberbodyinthecountryoftherequester. ISO copyright office CP 401 · Ch. de Blandonnet 8 CH-1214 Vernier, Geneva Phone: +4122 749 0111 Email: copyright@iso.org Website: www.iso.org Published in Switzerland ii @ IS0 2022 - All rights reserved