ISO INTERNATIONAL STANDARD 23170 First edition 2022-06 Surface chemical analysis Depth profiling Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering Analyse chimique des surfaces - Profilage d'epaisseur - Profilage d'epaisseur non destructif de films minces d'oxydes de métaux lourds a I'échelle nanométrique sur des substrats de Si par diffusion d'ions de moyenne énergie Reference number IS0 23170:2022(E) ISO @IS02022 IS0 23170:2022(E) COPYRIGHTPROTECTED DOCUMENT @ISO2022 All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on the internet or an intranet, withoutpriorwrittenpermission.Permission can berequestedfrom eitherIso at theaddress below orIso'smemberbodyinthecountryoftherequester. ISO copyright office CP 401 · Ch. de Blandonnet 8 CH-1214 Vernier, Geneva Phone: +4122 749 0111 Email: [email protected] Website: www.iso.org Published in Switzerland ii @ IS0 2022 - All rights reserved