论文标题
胶体纳米晶体 / al $ _2 $ o $ _3 $复合膜由原子层沉积制造
Robust and Bright Photoluminescence from Colloidal Nanocrystal / Al$_2$O$_3$ Composite Films fabricated by Atomic Layer Deposition
论文作者
论文摘要
胶体纳米晶体是一种有希望的荧光材料类,其自发发射特征可以通过其组成,几何形状和尺寸在广泛的光谱范围内调节。然而,要将纳米晶体膜嵌入精制的装置几何形状中,一个重要的缺点是它们的发射特性在进一步制造的过程(如光刻,金属或氧化物沉积等)上的敏感性。在这项工作中,我们可以通过将Nanocrystal spiortions与Spiners spirentions结合使用,从而证明如何通过将nanocrystal spotitions结合起来,从而证明如何获得明亮的发射和可靠的薄膜。对于所得的复合膜,可以在纳米级上控制层厚度,并且它们的折射率可以通过沉积的氧化铝量来精心调整。椭圆测量法用于测量介电介电常数的真实和虚构部分,该部分可直接访问膜的依赖于波长的折射率吸光度。对具有不同形状和不同壳厚度的核壳纳米晶体的薄膜的光体物理学的详细分析,可以将光致发光和衰减寿命的行为与氧化铝沉积引起的非辐射率的变化相关联。我们表明,这种复合膜的光发射特性在几个月内在波长和强度上是稳定的,并且光致发光完全从加热过程中恢复到高达240 $^\ Circ $ c。后者特别有趣,因为它证明了对典型的热处理的鲁棒性,在几个过程步骤中所需的典型热处理,例如基于抗性的光刻和通过热或电子束蒸发金属或氧化物的沉积。
Colloidal nanocrystals are a promising fluorescent class of materials, whose spontaneous emission features can be tuned over a broad spectral range via their composition, geometry and size. However, towards embedding nanocrystals films in elaborated device geometries, one significant drawback is the sensitivity of their emission properties on further fabrication processes like lithography, metal or oxide deposition, etc. In this work, we demonstrate how bright emitting and robust thin films can be obtained by combining nanocrystal deposition from solutions via spin2 coating with subsequent atomic layer deposition of alumina. For the resulting composite films, the layer thickness can be controlled on the nanoscale, and their refractive index can be finely tuned by the amount of deposited alumina. Ellipsometry is used to measure the real and imaginary part of the dielectric permittivity, which gives direct access to the wavelength dependent refractive index absorbance of the film. Detailed analysis of the photophysics of thin films of core-shell nanocrystal with different shape and different shell thickness allow to correlate the behavior of the photoluminescence and of the decay life time to the changes in the non-radiative rate that are induced by the alumina deposition. We show that the photoemission properties of such composite films are stable in wavelength and intensity over several months, and that the photoluminescence completely recovers from heating processes up to 240$^\circ$C. The latter is particularly interesting, since it demonstrates robustness to the typical heat treatment that is needed in several process steps like resist-based lithography and deposition by thermal or electron beam evaporation of metals or oxides.