论文标题

关于照片辅助o $^ - $离子生产的实验证据

Experimental evidence on photo-assisted O$^-$ ion production from Al$_2$O$_3$ cathode in cesium sputter negative ion source

论文作者

Tarvainen, O., Kronholm, R., Laitinen, M., Reponen, M., Julin, J., Toivanen, V., Napari, M., Marttinen, M., Faircloth, D., Koivisto, H., Sajavaara, T.

论文摘要

通常认为肝溅射离子源中负离子的负离子的产生是纯表面过程。最近有人提出,离子对产生可以解释从这些离子源中提取的高于预期的束电流,因此为激光辅助增强负离子产量打开了大门。我们已经通过测量各种脉冲二极管激光器对由Al $ _2 $ o $ o $ _3 $ cesium溅射离子源阴极产生的O $^ - $ beam电流的影响来检验了这一假设。预计O $^ - $的离子对产生需要填充中性剖宫产的5D电子状态,从而暗示该过程仅应使用特定的波长引发。我们的实验结果提供了证据证明存在依赖波长的照片辅助效应,但对其所谓的共鸣性产生了怀疑,因为可以观察到梁电流的迅速增强,而激光波长超过阈值光子能量。在激光脉冲期间观察到的束电流瞬变表明,束电流增强的幅度和寿命取决于阴极表面上的纤维平衡。我们得出的结论是,在离子源的某些操作环境下,照片辅助的负离子产生可能具有实际重要性,因为它可以使提取的光束电流增加一倍以上。

The production of negative ions in cesium sputter ion sources is generally considered to be a pure surface process. It has been recently proposed that ion pair production could explain the higher-than-expected beam currents extracted from these ion sources, therefore opening the door for laser-assisted enhancement of the negative ion yield. We have tested this hypothesis by measuring the effect of various pulsed diode lasers on the O$^-$ beam current produced from Al$_2$O$_3$ cathode of a cesium sputter ion source. It is expected that the ion pair production of O$^-$ requires populating the 5d electronic states of neutral cesium, thus implying that the process should be provoked only with specific wavelengths. Our experimental results provide evidence for the existence of a wavelength-dependent photo-assisted effect but cast doubt on its alleged resonant nature as the prompt enhancement of beam current can be observed with laser wavelengths exceeding a threshold photon energy. The beam current transients observed during the laser pulses suggest that the magnitude and longevity of the beam current enhancement depends on the cesium balance on the cathode surface. We conclude that the photo-assisted negative ion production could be of practical importance as it can more than double the extracted beam current under certain operational settings of the ion source.

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