论文标题

飞秒激光辐照单层WS2中光致发光发射的巨型增强

Giant Enhancement of Photoluminescence Emission in Monolayer WS2 by Femtosecond Laser Irradiation

论文作者

Chengbing, Qin, Xilong, Liang, Shuangping, Han, Guofeng, Zhang, Ruiyun, Chen, Jianyong, Hu, Liantuan, Xiao, Suotang, Jia

论文摘要

单层过渡金属二分法已经成为光电和纳米摄影设备的有前途的材料。但是,低光致发光(PL)量子产率(QY)阻碍了其各种潜在应用。在这里,我们通过飞秒激光照射来设计和增强单层WS2的PL强度。与准备好的样品相比,确定了PL强度的两个以上的数量级增强。此外,与连续波激光辐照的PL强度提高相比,工程时间缩短了三个数量级。基于PL光谱的演变,我们将巨型PL增强归因于从TRION发射到激子的转换,以及当激子和TRION定位于新形成的缺陷时,QY的改进。我们基于PL强度的增强在单层WS2上创建了微观结构,在此过程中可以稳定地存储工程结构超过三年。这种灵活的方法具有出色的长期存储稳定性功能,可以在信息存储,显示技术和光电设备中应用。

Monolayer transition metal dichalcogenides have emerged as promising materials for optoelectronic and nanophotonic devices. However, the low photoluminescence (PL) quantum yield (QY) hinders their various potential applications. Here we engineer and enhance the PL intensity of monolayer WS2 by femtosecond laser irradiation. More than two orders of magnitude enhancement of PL intensity as compared to the as-prepared sample is determined. Furthermore, the engineering time is shortened by three orders of magnitude as compared to the improvement of PL intensity by continuous-wave laser irradiation. Based on the evolution of PL spectra, we attribute the giant PL enhancement to the conversion from trion emission to exciton, as well as the improvement of the QY when exciton and trion are localized to the new-formed defects. We have created microstructures on the monolayer WS2 based on the enhancement of PL intensity, where the engineered structures can be stably stored for more than three years. This flexible approach with the feature of excellent long-term storage stability is promising for applications in information storage, display technology, and optoelectronic devices.

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