论文标题
Ehrlich-Schwoebel潜在障碍对薄膜生长的狼村模型模拟的影响
Effects of The Ehrlich-Schwoebel Potential Barrier on the Wolf-Villain Model Simulations for Thin Film Growth
论文作者
论文摘要
\ emph {Wolf-Villain（WV）模型}是一种简单的模型，用于研究\ Emph {ifeal}分子束外延（MBE）通过使用计算机模拟。在此模型中，ADATOM在有限扩散长度内即时扩散，以最大化其协调数。我们研究该模型生长的薄膜的统计特性。发现WV模型的形态在动力学上是粗糙的，而下坡粒子扩散电流。然而，在实际的MBE增长中，还有其他因素，例如存在潜在的障碍，被称为\ emph {ehrlich-schwoebel（es）屏障}。 ES屏障是Adatom的附加屏障，该屏障从上部到下部露台上的步进边缘扩散，该露台已知会诱导上坡颗粒电流。我们发现，随着ES屏障的添加，WV-ES模型的形态是粗糙的，当屏障足够坚固时，表面上有\ emph {mound形成}。为了确认这些结果，还研究了相关函数。我们发现WV模型中的相关函数中没有振荡。对于WV-ES模型，相关函数振荡。这些结果证实，在我们的研究中，足够强大的ES屏障会在WV表面引起丘陵形成。
\emph{Wolf-Villain (WV) model} is a simple model used to study \emph{ideal} molecular beam epitaxy (MBE) growth by using computer simulations. In this model, an adatom diffuses instantaneously within a finite diffusion length to maximize its coordination number. We study statistical properties of thin films grown by this model. The morphology of the WV model is found to be kinetically rough with a downhill particle diffusion current. In real MBE growth, however, there are additional factors such as the existence of a potential barrier that is known as the \emph{Ehrlich-Schwoebel (ES) barrier}. The ES barrier is an additional barrier for an adatom that diffuses over a step edge from the upper to a lower terrace which is known to induce an uphill particle current. We found that with the addition of the ES barrier, the WV-ES model morphology is rough with \emph{mound formation} on the surface when the barrier is strong enough. To confirm these results, the correlation function is also studied. We find no oscillation in the correlation function in the WV model. For the WV-ES model, the correlation function oscillates. These results confirm that a strong enough ES barrier can cause mound formation on the WV surface in our study.
