论文标题

Weyl Fermi弧的无限浆果曲率

Infinite Berry Curvature of Weyl Fermi Arcs

论文作者

Wawrzik, Dennis, You, Jhih-Shih, Facio, Jorge I., Brink, Jeroen van den, Sodemann, Inti

论文摘要

我们表明,Weyl Fermi Arcs通常伴随着表面浆果曲率缩放为$ 1/k^2 $的分歧,其中$ k $是与表面brillouin区域中热线的距离,它连接了与Fermi Arc本身不同的Weyl节点的投影。每当散装Weyl分散体向感兴趣的表面倾斜速度时,这种表面浆果曲率就会出现。这种差异反映在各种浆果曲率介导的效果中,这些效应易于实验,尤其是导致表面浆果曲率偶极子,该偶极偶极子与长寿命的极限在表面状态的极限中与灯泡的厚度线性生长。这意味着在此类设备中对非线性霍尔效应的巨大贡献的出现。

We show that Weyl Fermi arcs are generically accompanied by a divergence of the surface Berry curvature scaling as $1/k^2$, where $k$ is the distance to a hot-line in the surface Brillouin zone that connects the projection of Weyl nodes with opposite chirality but which is distinct from the Fermi arc itself. Such surface Berry curvature appears whenever the bulk Weyl dispersion has a velocity tilt toward the surface of interest. This divergence is reflected in a variety of Berry curvature mediated effects that are readily accessible experimentally, and in particular leads to a surface Berry curvature dipole that grows linearly with the thickness of a slab of a Weyl semimetal material in the limit of long lifetime of surface states. This implies the emergence of a gigantic contribution to the non-linear Hall effect in such devices.

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