论文标题
外延铁电LA掺杂HF0.5ZR0.5O2薄膜
Epitaxial Ferroelectric La-doped Hf0.5Zr0.5O2 Thin Films
论文作者
论文摘要
与LA一起使用的掺杂铁电HF0.5ZR0.5O2是提高耐力的有前途的途径。但是，LA对多晶膜耐力的有益作用可能伴随着保留率的降解。我们已经调查了LA掺杂的外延膜中的耐力 - 保留困境。与不稳定的外延膜相比，在厚度范围更大的情况下获得了巨大的极化值，而强制场相似，并且泄漏电流大大降低。与多晶La掺杂膜相比，外延la掺杂膜显示出更多的疲劳，但没有明显的唤醒效果和耐耐力的困境。多晶La掺杂的HF0.5ZR0.5O2膜所常见的持续唤醒效果仅限于外延膜中的几个周期。尽管疲劳，但外延la掺杂膜的耐力超过1010个周期，并且这种良好的特性伴随着超过10年的出色保留。这些结果表明，在LA掺杂的HF0.5ZR0.5O2中，唤醒效果和耐耐受性难题不是固有的。
Doping ferroelectric Hf0.5Zr0.5O2 with La is a promising route to improve endurance. However, the beneficial effect of La on the endurance of polycrystalline films may be accompanied by degradation of the retention. We have investigated the endurance - retention dilemma in La-doped epitaxial films. Compared to undoped epitaxial films, large values of polarization are obtained in a wider thickness range, whereas the coercive fields are similar, and the leakage current is substantially reduced. Compared to polycrystalline La-doped films, epitaxial La-doped films show more fatigue but there is not significant wake-up effect and endurance-retention dilemma. The persistent wake-up effect common to polycrystalline La-doped Hf0.5Zr0.5O2 films, is limited to a few cycles in epitaxial films. Despite fatigue, endurance in epitaxial La-doped films is more than 1010 cycles, and this good property is accompanied by excellent retention of more than 10 years. These results demonstrate that wake-up effect and endurance-retention dilemma are not intrinsic in La-doped Hf0.5Zr0.5O2.
