论文标题

新硅光电吸收测量的对暗物质排除限制的影响

Effect on Dark Matter Exclusion Limits from New Silicon Photoelectric Absorption Measurements

论文作者

von Krosigk, Belina, Wilson, Matthew J., Stanford, Chris, Cabrera, Blas, Calkins, Robert, Jardin, Daniel, Kurinsky, Noah A., Ponce, Francisco, Wu, Chih-Pan

论文摘要

低温硅检测器技术的最新突破允许观察通过目标材料中的粒子相互作用释放的单电子孔对。这意味着对能量沉积的敏感性低于最小的频带间隙,即硅的$ \ sim1.2 $ eV,因此对ev/$ c^2 $ c^2 $ scale-scale bosonic暗物质以及低于100 mev/$ c^2 $的质量的暗物质的敏感性。在直接搜索中可以探测当前可访问质量最低质量的各种相互作用通道与标准光电吸收有关。在这些各自的暗物质信号模型中,光电吸收横截面上的任何不确定性都传播到由此产生的排除极限或潜在观察的重要性中。使用最近在斯坦福大学进行的硅光电吸收横截面的首次精确测量,本文研究了在低能量和低温温度下对这些暗物质搜索进行准确了解此参数的重要性。

Recent breakthroughs in cryogenic silicon detector technology allow for the observation of single electron-hole pairs released via particle interactions within the target material. This implies sensitivity to energy depositions as low as the smallest band gap, which is $\sim1.2$ eV for silicon, and therefore sensitivity to eV/$c^2$-scale bosonic dark matter and to thermal dark matter at masses below 100 MeV/$c^2$. Various interaction channels that can probe the lowest currently accessible masses in direct searches are related to standard photoelectric absorption. In any of these respective dark matter signal models any uncertainty on the photoelectric absorption cross section is propagated into the resulting exclusion limit or into the significance of a potential observation. Using first-time precision measurements of the photoelectric absorption cross section in silicon recently performed at Stanford University, this article examines the importance having accurate knowledge of this parameter at low energies and cryogenic temperatures for these dark matter searches.

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