论文标题

SI空缺在硅晶界O,C和N的隔离中的作用:一项从头算研究

The role of Si vacancies in the segregation of O, C, and N at silicon grain boundaries: An ab initio study

论文作者

Maji, Rita, Contreras-García, Julia, Capron, Nathalie, Degoli, Elena, Luppi, Eleonora

论文摘要

晶界(GB)是晶体生长期间用于SI太阳能细胞制造的晶体生长过程中多晶硅中的缺陷。 GBS的存在改变了SI的配位,使电荷载体重组是有利的,从而使载体的寿命显着降低。因此,GB对设备性能可能非常有害。此外,GB易于形成具有深层缺陷电子状态的空缺,也是各种杂质物种(例如C,N和O)的优先隔离位点。我们从第一原理研究了结构,能量和电子性能之间的相关性,$σ$σ$ 3 {111} {111} si GB与无空缺和Segrecation和Segrecation and c,and c. and c. and c,and n and c. and s and c。当存在空缺时,C和O原子强烈提高其分离的能力。但是,$σ$ 3 {111} si GB的电子性能不受O的存在影响,而它们在C的情况下可以很大变化。对于N原子,不可能在GB中有和没有空位的情况下找到能量和电子性能的明确趋势。实际上,由于n并非与c和o相关,因此在GB结构中找到新的化学排列更为灵活。这意味着与C和O杂质相比,在存在N杂质原子的情况下控制材料的特性更为强。

Grain boundaries (GBs) are defects originating in multi-crystalline silicon during crystal growth for device Si solar cell fabrication. The presence of GBs changes the coordination of Si, making it advantageous for charge carriers to recombine, which brings a significant reduction of carrier lifetimes. Therefore, GBs can be highly detrimental for device performances. Furthermore, GBs easily form vacancies with deep defect electronic states and are also preferential segregation sites for various impurity species, such as C, N, and O. We studied from first principles the correlation between structural, energetics, and electronic properties of the $Σ$3{111} Si GB with and without vacancies, and the segregation of C, N, and O atoms. C and O atoms strongly increase their ability to segregate when vacancies are present. However, the electronic properties of the $Σ$3{111} Si GB are not affected by the presence of O, while they can strongly change in the case of C. For N atoms, it is not possible to find a clear trend in the energetics and electronic properties both with and without vacancies in the GB. In fact, as N is not isovalent with Si, as C and O, it is more flexible in finding new chemical arrangements in the GB structure. This implies a stronger difficulty in controlling the properties of the material in the presence of N impurity atoms compared to C and O impurities.

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