论文标题

在原始和有缺陷的钻石表面上氧化基团的稳定性

Stability of Oxygenated Groups on Pristine and Defective Diamond Surfaces

论文作者

Oliveira, Eliezer, Li, Chenxi, Zhang, Xiang, Puthirath, Anand, Neupane, Mahesh R., Weil, James, Birdwell, A. Glen, Ivanov, Tony, Kong, Seoyun, Grey, Tia, Kannan, Harikishan, Vajtai, Robert, Galvao, Douglas, Ajayan, Pulickel

论文摘要

钻石的表面功能已通过多种技术(例如氧化)进行了广泛的研究。在氧化的钻石上相应地检测到了几个氧基,例如COC(酯),CO(酮症)和COH(羟基)。但是,这些组在钻石表面上的组成和相对浓度可能会受到氧合处理类型和钻石表面质量的影响。为了研究特定钻石表面上的氧化基团的稳定性,我们使用reaxff力场,CO,COC和COH基团在原始和有缺陷的钻石表面上的CO,COC和COH组的形成能进行了完全原子的反应性分子力学(FARMM)模拟进行了评估。根据我们的发现,COH组在完美(110)的表面上具有最低的地层能量,而COC在有缺陷的表面上受到青睐。至于(111)表面,COC组对于原始表面和有缺陷的表面都是最稳定的。同样,COC组也是缺陷/完美(311)表面上最稳定的组。通过这种方式,我们的结果表明,如果在钻石膜中(110)表面是主要的裸露刻面,那么吸附最多的氧基可以是COH或COC,其中COC将取决于表面缺陷的水平。

The surface functionalization of diamond has been extensively studied through a variety of techniques, such as oxidation. Several oxygen groups have been correspondingly detected on the oxidized diamond, such as COC (ester), CO (ketonic), and COH (hydroxyl). However, the composition and relative concentration of these groups on diamond surfaces can be affected by the type of oxygenation treatment and the diamond surface quality. To investigate the stability of the oxygenated groups at specific diamond surfaces, we evaluated through fully atomistic reactive molecular mechanics (FARMM) simulations, using the ReaxFF force field, the formation energies of CO, COC, and COH groups on pristine and defective diamond surfaces (110), (111), and (311). According to our findings, the COH group has the lowest formation energy on a perfect (110) surface, while the COC is favored on a defective surface. As for the (111) surface, the COC group is the most stable for both pristine and defective surfaces. Similarly, COC group is also the most stable one on the defective/perfect (311) surface. In this way, our results suggest that if in a diamond film the (110) surface is the major exposed facet, the most adsorbed oxygen group could be either COH or COC, in which the COC would depend on the level of surface defects.

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