论文标题
通过氢质量蚀刻来为石墨烯制造纳米级
Nanoscale Fabrication of Graphene by Hydrogen-Plasma Etching
论文作者
论文摘要
石墨烯由于其出色的电子和机械性能引起了广泛的兴趣。但是,尽管对纳米级设备很重要,但其边缘的结构和电子特性通常被忽略,因为边缘比通过降低设备尺寸而变得更大。在这项研究中,我们提出了一种通过施加氢 - 汗水蚀刻(HPE)技术来制造具有原子对齐曲折边缘的石墨烯的方法。通过在HPE之前对石墨烯进行图案,它可以成功地在所需的结构中塑造石墨烯。原子力显微镜和拉曼光谱学都证实,该技术形成的石墨烯即使在边缘也保持其蜂窝结构,该结构与锯齿形结构对齐。尽管尚未澄清氢 - 氢 - 蚀刻的各向异性蚀刻机制,但蚀刻速率的样品位置依赖性表明氢自由基是各向异性蚀刻的原因。
Graphene is attracting vast interest due to its superior electronic and mechanical properties. However, structure and electronic properties of its edge are often neglected, although they are important for nanoscale devices because the edge ratio becomes larger by decreasing the device size. In this study, we suggest a way to fabricate a graphene with atomically aligned zigzag edges by applying hydrogen-plasma etching (HPE) technique. By patterning a graphene prior to HPE, it is succeeded to shape a graphene in desired structure. Both atomic force microscopy and Raman spectroscopy confirm that the graphene shaped by this technique preserves its honeycomb structure even on the edge, which is aligned with zigzag structure. Although the mechanism of the anisotropic etching by hydrogen-plasma have not been clarified yet, the sample position dependence of the etching rate suggests that the hydrogen-radicals are responsible for the anisotropic etching.