论文标题
带有石墨烯量子点的氟化石墨烯膜用于电子应用
Fluorinated graphene films with graphene quantum dots for electronic applications
论文作者
论文摘要
这项工作分析了载体的传输,非平衡电荷的松弛以及带石墨烯量子点(GQD)的氟化石墨烯(FG)膜的电子结构。具有GQD的FG膜是通过在氢氟酸水溶液中化学官能化制造的。在最高200 mV的范围内发现了FG屏障内部潜在缓解的高度波动。提出了一种现象学表达,描述了GQD的非平衡电荷发射对量子限制水平和膜厚度(GQDS之间的潜在屏障参数)的依赖性。功能化程度的增加导致GQD大小的减小,GQD对载体转运的效应的去除以及非平衡电荷的松弛。对具有GQD的FG膜的电子特性的研究表明,在荧光度相对较高的荧光度和高电流调制的膜状结构中具有单极电阻开关效应,其荧光程度较低。据信,具有GQD的2D膜对于各种电子应用(非易失性记忆,具有光学控制和逻辑元素的2D连接)具有巨大潜力。
This work analyzes carrier transport, the relaxation of non-equilibrium charge, and the electronic structure of fluorinated graphene (FG) films with graphene quantum dots (GQDs). The FG films with GQDs were fabricated by means of chemical functionalization in an aqueous solution of hydrofluoric acid. High fluctuations of potential relief inside the FG barriers have been detected in the range of up to 200 mV. A phenomenological expression that describes the dependence of the time of non-equilibrium charge emission from GQDs on quantum confinement levels and film thickness (potential barrier parameters between GQDs) is suggested. An increase in the degree of functionalization leads to a decrease in GQD size, the removal of the GQD effect on carrier transport, and the relaxation of non-equilibrium charge. The study of the electronic properties of FG films with GQDs has revealed a unipolar resistive switching effect in the films with a relatively high degree of fluorination and a high current modulation in transistorlike structures with a lower degree of fluorination. 2D films with GQDs are believed to have considerable potential for various electronic applications (nonvolatile memory, 2D connections with optical control and logic elements).