论文标题
磁性绝缘体MNBI2TE4薄膜中异常大厅效应的表面驱动的演变
Surface-Driven Evolution of the Anomalous Hall Effect in Magnetic Topological Insulator MnBi2Te4 Thin Films
论文作者
论文摘要
了解界面修饰对磁性绝缘体薄膜功能特性的影响对于开发从旋转型到量子计算的新技术应用至关重要。在这里,我们报告说,通过控制表面氧化的传播,在固有磁性拓扑拓扑剂MNBI2TE4中诱导了大型电子和磁反应。我们表明,表面氧化物层的形成仅限于顶部的1-2个单位细胞,但在整体磁反应中驱动了很大的变化。具体而言,我们观察到由有限厚度磁性驱动的异常大厅效应的迹象的戏剧性逆转,这表明该膜分裂为具有独特的电子特征的独特的磁性层。这些数据揭示了MNBI2TE4对顶层的化学计量测定法的整体磁和电子响应的微妙依赖性。我们的研究表明,表面氧化引起的扰动可能在该系统中量子异常效应的稳定中起非平凡的作用,并且理解对表面的有针对性的修饰可能会为这种有趣的材料开辟新的新途径,以实现新的新途径。
Understanding the effects of interfacial modification to the functional properties of magnetic topological insulator thin films is crucial for developing novel technological applications from spintronics to quantum computing. Here, we report that a large electronic and magnetic response is induced in the intrinsic magnetic topological insulator MnBi2Te4 by controlling the propagation of surface oxidation. We show that the formation of the surface oxide layer is confined to the top 1-2 unit cells but drives large changes in the overall magnetic response. Specifically, we observe a dramatic reversal of the sign of the anomalous Hall effect driven by finite thickness magnetism, which indicates that the film splits into distinct magnetic layers each with a unique electronic signature. These data reveal a delicate dependence of the overall magnetic and electronic response of MnBi2Te4 on the stoichiometry of the top layers. Our study suggests that perturbations resulting from surface oxidation may play a non-trivial role in the stabilization of the quantum anomalous Hall effect in this system and that understanding targeted modifications to the surface may open new routes for engineering novel topological and magnetic responses in this fascinating material.