论文标题
在单缺损原子体中对高和低抗性状态的建模
Modeling of High and Low Resistant States in Single Defect Atomristors
论文作者
论文摘要
电阻 - 变化随机访问存储器(RRAM)设备是纳米级金属绝缘子 - 金属结构,可以将信息存储在其电阻状态,即高电阻(HRS)和低电阻(LRS)状态。它们是通用记忆的潜在候选者,因为这些非易失性记忆元素可以提供快速切换,长期保留和开关周期,此外,也适用于直接应用神经形态计算。在这项研究中,我们首先提出了一个模型,用于分析RRAM设备的不同电阻态或所谓的“原子体”,该态将新型的2D材料用作开关材料而不是绝缘体。然后,开发的模型用于研究单个缺陷单层MOS $ _ {2} $ MEMRISTOR的电气特性。当2D材料中的空位缺陷被电极中的金属原子取代时,HRS和LRS之间的设备电阻的变化与隧道概率的变化有关。由于缺陷和取代金属原子引起的失真,通过平均沿横向的效应平均效果在1D势能曲线中捕获。这种简化使我们能够以不太广泛的量子传输模型对单个缺陷候选人进行建模,同时考虑到缺陷的存在。
Resistance-change random access memory (RRAM) devices are nanoscale metal-insulator-metal structures that can store information in their resistance states, namely the high resistance (HRS) and low resistance (LRS) states. They are a potential candidate for a universal memory as these non-volatile memory elements can offer fast-switching, long retention and switching cycles, and additionally, are also suitable for direct applications in neuromorphic computing. In this study, we first present a model to analyze different resistance states of RRAM devices or so-called "atomristors" that utilize novel 2D materials as the switching materials instead of insulators. The developed model is then used to study the electrical characteristics of a single defect monolayer MoS$_{2}$ memristor. The change in the device resistance between the HRS and LRS is associated to the change in the tunneling probability when the vacancy defects in the 2D material are substituted by the metal atoms from the electrodes. The distortion due to defects and substituted metal atom is captured in the 1D potential energy profile by averaging the effect along the transverse direction. This simplification enables us to model single defect memristors with a less extensive quantum transport model while taking into account the presence of defects.