论文标题
磁通量和transmon Qubit之间的微波活化的大门
Microwave-activated gates between a fluxonium and a transmon qubit
论文作者
论文摘要
我们提出和分析了磁通量和跨量子标码之间的两种类型的微波活化门,即交叉谐振(CR)和CPHASE栅极。 Transmon和Fluxonium之间的较大频率差异使两倍栅极具有挑战性。对于中频磁通量子,Transmon-Fluxonium系统允许在较大的Transmon频率上介导的较高升温器介导的交叉谐振效应。这使人们可以通过在Transmon频率下驱动磁通量来实现交叉谐振门,从而减轻与频率靶向和残留ZZ耦合有关的Transmon-Transmon芯片中跨谐和门的典型问题。但是,当磁磁体的基本频率进入低于100 MHz的低频状态时,交叉谐音效应降低了导致较长的栅极时间。对于这一范围的参数,可以使用较高的磁通量来实现快速的微波CPHASE门。在这两种情况下,我们都对栅极进行数值模拟,表明可以在100至300 ns之间获得栅极忠诚度以上99%以上。在详细的栅极分析之后,我们对Fluxonia和Transmons的表面代码晶格进行了芯片产量研究,并通过提出的交叉谐振门相互作用。我们发现与仅作为本机双Quitage的跨谐音门的仅跨月架构相比,您的产量要好得多。
We propose and analyze two types of microwave-activated gates between a fluxonium and a transmon qubit, namely a cross-resonance (CR) and a CPHASE gate. The large frequency difference between a transmon and a fluxonium makes the realization of a two-qubit gate challenging. For a medium-frequency fluxonium qubit, the transmon-fluxonium system allows for a cross-resonance effect mediated by the higher levels of the fluxonium over a wide range of transmon frequencies. This allows one to realize the cross-resonance gate by driving the fluxonium at the transmon frequency, mitigating typical problems of the cross-resonance gate in transmon-transmon chips related to frequency targeting and residual ZZ coupling. However, when the fundamental frequency of the fluxonium enters the low-frequency regime below 100 MHz, the cross-resonance effect decreases leading to long gate times. For this range of parameters, a fast microwave CPHASE gate can be implemented using the higher levels of the fluxonium. In both cases, we perform numerical simulations of the gate showing that a gate fidelity above 99% can be obtained with gate times between 100 and 300 ns. Next to a detailed gate analysis, we perform a study of chip yield for a surface code lattice of fluxonia and transmons interacting via the proposed cross-resonance gate. We find a much better yield as compared to a transmon-only architecture with the cross-resonance gate as native two-qubit gate.