论文标题
弱拓扑绝缘子的堆叠断层处的非平凡无间隙电子状态
Nontrivial gapless electronic states at the stacking faults of weak topological insulators
论文作者
论文摘要
诸如堆叠断层之类的晶格缺陷可能会掩盖真实材料的电子拓扑特征。实际上,缺陷是一种无序的来源,可以增强系统的密度和系统的电导率,并且可以打破可以保护拓扑状态的晶体对称性。另一方面,近年来已经表明,晶格缺陷可以充当非平凡拓扑的来源。由最近在三维(3D)拓扑系统(例如BI $ _2 $ TEI和BI $ _ {14} $ RH $ _3 $ _3 $ i $ _9 $)上进行的实验的动机,我们研究了堆叠故障对弱拓扑绝缘子(WTIS)电子特性的影响。使用由由3D WTI组成的简单模型,该模型由弱耦合的二维(2D)拓扑层组成,该拓扑层被琐碎的间隔者隔开,我们发现2D堆叠断层可以携带自己的,拓扑上的非平凡无缝隙状态。根据WTI特性以及实现堆叠断层的方式,后者可以形成受拓扑保护的2D半学,但也可以形成一个嵌入在较高维度的WTI散装中的2D拓扑绝缘子。这表明将真实材料中使用堆叠断层作为拓扑非平凡,对称性保护的导电状态的可能性。
Lattice defects such as stacking faults may obscure electronic topological features of real materials. In fact, defects are a source of disorder that can enhance the density of states and conductivity of the bulk of the system and they break crystal symmetries that can protect the topological states. On the other hand, in recent years it has been shown that lattice defects can act as a source of nontrivial topology. Motivated by recent experiments on three-dimensional (3D) topological systems such as Bi$_2$TeI and Bi$_{14}$Rh$_3$I$_9$, we examine the effect of stacking faults on the electronic properties of weak topological insulators (WTIs). Working with a simple model consisting of a 3D WTI formed by weakly-coupled two-dimensional (2D) topological layers separated by trivial spacers, we find that 2D stacking faults can carry their own, topologically nontrivial gapless states. Depending on the WTI properties, as well as the way in which the stacking fault is realized, the latter can form a topologically protected 2D semimetal, but also a 2D topological insulator which is embedded in the higher-dimensional WTI bulk. This suggests the possibility of using stacking faults in real materials as a source of topologically nontrivial, symmetry-protected conducting states.